Gold nanoparticles-attached NH 2 + ion implanted silicon substrate: Preparation, characterization, and application in SERS

Shuoqi Li,Lu Liu,Huifeng Tian,Jingbo Hu
DOI: https://doi.org/10.1016/j.vacuum.2012.03.056
IF: 4
2013-01-01
Vacuum
Abstract:NH2+ ion implantation was performed at the energy of 80 keV with fluence of 2 × 1016 ions cm−2 for silicon, and the implantation of amino groups on the silicon surface was verified by X-ray photoelectron spectroscopy (XPS) analysis. Well-defined gold nanoparticles (AuNPs) film was formed with a submonolayer coverage on the obtained NH2+ ion implanted silicon (NH2/Si) surface, as revealed by the scanning electron microscopic (SEM) observations. Such AuNPs attached NH2/Si (AuNPs/NH2/Si) substrates showed a strong Surface-Enhanced Raman Scattering (SERS) effect, which enabled the detection of rhodanime 6G (R6G) at 10−11 M. NH2+ ion implantation appears to be a viable approach of preparing reproducible SERS substrates for sensitive Raman detection.
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