An Analysis of Degradation and Stability of Polyaniline Doped with Three Common Industrial Acids

Ren-Chun Fu,Jun Du,Hui Huang,Zhong-Cheng Guo
DOI: https://doi.org/10.4028/www.scientific.net/amr.774-776.767
2013-01-01
Advanced Materials Research
Abstract:The nature of doping acid play important role on the stability of conductive polyaniline (PANI). Many recent investigations have focused on different organic acids. Most organic acids are expensive and difficult to synthesize. According to industrial application, it is important to quantify the stability of conductive polyaniline doped with common acids. Herein, three common industrial acids (hydrochloric acid (HCl), sulfuric acid (SA), methanesulfonic acid (MSA)) doped conductive polyaniline was reported. The degradation performance of polyaniline was investigated by XRD and thermogravimetric analysis (TGA). The mechanism of degradation of PANI was discussed. The result indicated that the stability of PANI-HCl was better than that of other two samples. The optimization processing temperature of PANI-HCl is 100°C~150°C.
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