Abstract:As the most basic interconnection metallic material, copper (Cu) has been widely used in giant-large scale integrated circuits (GLSI). Corrosion inhibitors always play a crucial role in the Cu chemical mechanical polishing (CMP) process. The passivation of hydrogen peroxide (H2O2) alone is too weak to adequately protect against chemical corrosion on the surface of Cu film, thus, it is necessary to add corrosion inhibitors to the slurry. As a representative corrosion inhibitor, 1, 2, 4-triazole was compared with a novel corrosion inhibitor known as TT-LYK (ethanol, 2, 2′-[[(methyl-1H-benzotriazol-1-yl) methyl] imino] bis-), and their mixed inhibitor was studied in this paper. Different analytical methods such as the potentiodynamic polarization test, physical appearance phenomenon analysis, contact angle measurement and dynamic polishing experiment were used to compare their inhibition properties, and the fitting of different adsorption isotherms and static erosion tests were used to clarify the adsorption types and passivation processes respectively. The results indicated that both TT-LYK and 1, 2, 4-triazole achieved the goal of inhibiting Cu surface corrosion, but the inhibition effect of TT-LYK was slightly weaker at the same mass fraction. The corrosion protection of the two inhibitors is mainly attributable to the presence of organic inhibitor molecules on the surface of Cu by chemisorption and physisorption simultaneously. The passivation processes of both can be divided into two steps. First, the direct growth of the Cu-inhibitor passivation film occurs, followed by the redeposition of the Cu-inhibitor complex. From the results of electrochemical experiments, it can be concluded that the structure of the thin passivation film growing on the Cu surface varies with the inhibitor, and the composition of the passivation film was investigated by XPS and Raman spectrum analysis. At the same time, the surface roughness after polishing was found to decrease with the increase in inhibition effect of the inhibitors. According to the inhibition characteristics of these two inhibitors, a mixed corrosion inhibitor (TT-LYK and 1, 2, 4-triazole) was proposed in this study. Under the synergistic inhibition action, better inhibition effect and surface quality for Cu CMP were obtained. This outcome may be ascribed to the variation in the structure and density of the passivation film.

Electrochemical Investigation of Cyproconazole As Corrosion Inhibitor for Copper in Synthetic Seawater

Study on Adsorption Behavior of Ketoconazole on Q235 Mild Steel in 1.0 M HCl Solution with Electrochemical Measurement

Exploring sustainable corrosion inhibition of copper in saline environment: An examination of hydroquinazolinones via experimental and ab initio DFT simulations

Exploring the effectiveness of two triazole derivatives as copper corrosion inhibitors in NaCl solution: A combined approach of quantitative chemistry and dynamic molecular simulations

Synergistic inhibition of azoles compounds on chloride-induced atmospheric corrosion of copper: Experimental and theoretical characterization

Two common antihistamine drugs as high-efficiency corrosion inhibitors for copper in 0.5M H2SO4

Chemical, Electrochemical and Morphology Studies on Methyl Hydroxyethyl Cellulose as Green Inhibitor for Corrosion of Copper in Hydrochloric acid Solutions

Phenothiazine drugs as novel and eco-friendly corrosion inhibitors for copper in sulfuric acid solution

Recycling of expired ciprofloxacin in synthetic acid rain (SAR) solution as a green corrosion inhibitor for copper: a theoretical and experimental evaluation

Temporal Aspects of Corrosion Inhibition on Copper, Silver, and Copper-Silver Alloy: An Electrochemical Impedance Spectroscopy Study

Synthesis and evaluation of benzo[1,2,3]selenadiazole-isoxazoles as corrosion inhibitors for copper in NaCl: An integrated experimental and theoretical approach

Condensed Fukui function and experimental evaluation of the corrosion inhibition properties of some antipyrinyl‐imidazotriazole and their derivatives for copper in an acidic environment

A study of the inhibitive effect for corrosion of steel in 1.0 M HCl using a new nonionic surfactant based on coumarin moiety: chemical, electrochemical and quantum mechanics calculations

Adsorption behavior and corrosion inhibition performance of tetrazolium derivatives on electrolytic copper foil surface

Electrochemical and Xps Investigation of Phthalocyanine Oligomer Sulfonate As A Corrosion Inhibitor for Iron in Hydrochloric Acid

Study on the compounding of cysteine modified Schiff base and decanoic acid as corrosion inhibitors for bronze with patina

Assessment of Anti-corrosion Behavior of Three Triazolyl Schiff Bases in 3.5 wt% NaCl Solution: Experimental and Theoretical Approaches

Experimental and Computational Investigation of Salicylhydroxamic Acid as a Corrosion Inhibitor for Copper in Alkaline Solutions

Evaluation of Idesia polycarpa Maxim fruits extract as a natural green corrosion inhibitor for copper in 0.5 M sulfuric acid solution

Experimental and theoretical study of 2-mercaptopyridine as an effective eco-friendly inhibitor for copper in aqueous NaCl

Study on the film forming mechanism, corrosion inhibition effect and synergistic action of two different inhibitors on copper surface chemical mechanical polishing for GLSI