The Accelerating Effect of High Magnetic Field Annealing on the Interdiffusion Behavior of Co/Ni Films

Yue Zhao,Donggang Li,Kai Wang,Qiang Wang,Agnieszka Franczak,Alexandra Levesque,Jean-Paul Chopart,Jicheng He
DOI: https://doi.org/10.1016/j.matlet.2013.05.036
IF: 3
2013-01-01
Materials Letters
Abstract:The effects of high magnetic field annealing on the interdiffusion of Co/Ni bilayer films were investigated in this paper. A clear CoNi alloying zone can be observed by field emission scanning electron microscopy and energy dispersive spectroscopy, for samples annealed with and without magnetic field. Significant Co and Ni interdiffusion was verified by X-ray photoelectron spectroscopy. Based on the thickness of the diffusion layer, the distribution of atoms and the microstructure of interfacial products, the interdiffusion coefficients of the bilayer diffusion couples were calculated. Compared with the no-field case, the interdiffusion coefficient clearly increased when a high magnetic field of 12T was applied. This effect can be attributed to an increase in the chemical potential gradient induced by magnetic free energy in a high magnetic field.
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