Simultaneous Reduction and N-doping of Graphene Oxides by Low-Energy N2+ Ion Sputtering

Liang Zhang,Yifan Ye,Dingling Cheng,Wenhua Zhang,Haibin Pan,Junfa Zhu
DOI: https://doi.org/10.1016/j.carbon.2013.06.018
IF: 10.9
2013-01-01
Carbon
Abstract:An easy and catalyst-free method was used to obtain N-doped reduced graphene oxides (N-RGO) through low-energy N2+ ion sputtering of graphene oxides (GO). The simultaneous reduction and N-doping of GO during the sputtering were systematically investigated by X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure and Raman spectroscopy. The N-doping and reduction levels, which are determined by the N/C and O/C atomic ratios from the quantitative XPS analysis, respectively, can be easily controlled by varying the N2+ ion sputtering time. In addition, three different N species, namely, nitrile-like N, graphitic N and pyridinic N, can be distinguished in N-RGO.
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