Abstract:Indium tin oxide (ITO) thin films were deposited on glass substrates by ion beam sputter deposition method in three different deposition conditions [(i) oxygen (O2) flow rate varied from 0.05 to 0.20sccm at a fixed argon (1.65sccm) flow rate, (ii) Ar flow rate changed from 1.00 to 1.65sccm at a fixed O2 (0.05sccm) flow rate, and (iii) the variable parameter was the deposition time at fixed Ar (1.65sccm) and O2 (0.05sccm) flow rates]. (i) The X-ray diffraction (XRD) patterns show that the ITO films have a preferred orientation along (400) plane; the orientation of ITO film changes from (400) to (222) direction as the O2 flow rate is increased from 0.05 to 0.20sccm. The optical transmittance in the visible region increases with increasing O2 flow rate. The sheet resistance (Rs) of ITO films also increases with increasing O2 flow rate; it is attributed to the decrease of oxygen vacancies in the ITO film. (ii) The XRD patterns show that the ITO film has a strong preferred orientation along (222) direction. The optical transmittance in the visible spectral region increases with an increase in Ar flow rate. The Rs of ITO films increases with increasing Ar flow rate; it is attributed to the decrease of grain size in the films. (iii) A change in the preferred orientations of ITO films from (400) to (222) was observed with increasing film thickness from 314 to 661nm. The optical transmittance in the visible spectral region increases after annealing at 200°C. The Rs of ITO film decreases with the increase of film thickness.

X-ray photoemission spectroscopy studies of indium-tin-oxide films treated by oxygen plasma immersion ion implantation

X-Ray Photoelectron Spectroscopy Studies Of Indium-Tin-Oxide Treated Via Oxygen Plasma Immersion Ion Implantation

Surface treatment of indium-tin-oxide films via plasma immersion ion implantation

Work Function Enhancement of Indium Tin Oxide Via Oxygen Plasma Immersion Ion Implantation

Surface work function of indium tin oxide treated using plasma immersion ion implantation

Surface Modification of Indium Tin Oxide by Oxygen Plasma Immersion Ion Implantation

P-type Tin–indium Oxide Films Prepared by Thermal Oxidation of Metallic InSn Alloy Films

Angle dependent X-ray photoemission study on UV-ozone treatments of indium tin oxide

Synchrotron Radiation Photoelectron study of ITO surface

Synchrotron radiation photoelectron spectroscopy study of ITO surface

Surface treatment of indium tin oxide by oxygen-plasma for organic light-emitting diodes

Surface Coloration And Electrochemical Impedance Spectroscopy Characterization Of Oxygen Plasma Implanted Orthopaedic Titanium Alloys

Properties of PET/ITO Thin Films Deposited by DC Magnetron Sputtering

Structural, Electrical, and Optical Properties of ZnInO Alloy Thin Films

Indium–Tin–Oxide Nanostructures for Plasmon-Enhanced Infrared Spectroscopy: A Numerical Study

Elemental distribution and oxygen deficiency of magnetron sputtered ITO films

Effects of the Variations of Oxide Structure on the Electrical and Optical Properties of ITO Films

Work function changes of plasma treated indium tin oxide

Characterization of nanocrystalline indium tin oxide thin films prepared by ion beam sputter deposition method

Surface Properties of Indium Tin Oxide Treated by Cl-2 Inductively Coupled Plasma

Enhancement in photoelectric properties of ITO films by regulating defects and dopants with supercritical fluid treatment