Si/SnSe2 Multilayer Films for Phase Change Memory Applications

Mingcheng Sun,Yifeng Hu,Bo Shen,Jiwei Zhai,Sannian Song,Zhitang Song
DOI: https://doi.org/10.1080/10584587.2012.741363
2012-01-01
Integrated Ferroelectrics
Abstract:Si/SnSe2 multilayer films with different thickness of Si layers and monolayer SnSe2 film were prepared by radio-frequency magnetron sputtering system. X-Ray diffraction analysis revealed the change of phase structure with annealing temperature for the Si/SnSe2 multilayer films and SnSe2 films. It showed the inserting Si layers restrained the crystallization of SnSe2. The results of cross-sectional transmission electron microscopy confirmed the multilayer structure with clear interfaces between Si and SnSe2 layers. The Si/SnSe2 multilayer films showed high crystalline resistance and their 10-year data retention temperature reached 83 degrees C. The low activation energy and the high crystalline resistance would contribute to the reduction of power consumption in practical applications.
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