Study on the Reduction of Tungsten Trioxide Nanowire Films by Argon Ion Bombardment with X-ray Photoelectron Spectrometry

GONG Li,LIU Xiao,XIE Fang-yan,ZHANG Wei-hong,CHEN Jian
DOI: https://doi.org/10.3969/j.issn.1004-4957.2009.01.005
2009-01-01
Abstract:The reduction of tungsten trioxide nanowire films produced by Ar ion bombardment was studied using in-situ X-ray photoelectron spectrometry(XPS).Experimental results showed that the high valence state of tungsten was reduced to its lower states gradually,namely,W6+-W5+-W4+-W2+-W0,and that the tungsten oxide films with multiple valences were obtained.Based on its mechanistic study,it was found that the preferential sputtering played a key role in the process of the surface reduction.
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