Solvent vapor induced dewetting in diblock copolymer thin films

Juan Peng,Yu Xuan,Hanfu Wang,Binyao Li,Yanchun Han
DOI: https://doi.org/10.1016/j.polymer.2005.05.042
IF: 4.6
2005-01-01
Polymer
Abstract:The dewetting pattern development of thin film of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer has been studied after ‘annealing’ in the PMMA block selective solvent vapor. Initially, typical circular dewetted holes are observed. Further annealing, however, results in the formation of fractal-like holes. The heterogeneous stress induced by the residual solvent remaining in the film after spin-coating induces the anisotropy of the polymer mobility during the annealing process, which triggers the formation of the intriguing surface patterns.
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