Progresses on Applications of Atomic Layer Deposition in Solar Cells

XIE Zhangyi,XIE Liheng,GENG Yang,SUN Qingqing,ZHOU Peng,LU Hongliang,ZHANG Wei
DOI: https://doi.org/10.16818/j.issn1001-5868.2012.03.001
2012-01-01
Abstract:Atomic layer deposition(ALD) emerged as an important and advanced method for preparing nanoscale thin films for microelectronics and optoelectronics applications.ALD is more and more important in improving the efficiency of photovoltaic.It is probably becoming the most significant process method for the next generation of solar cells.Research progresses on applications of atomic layer deposition in solar cells are reviewed in this article.New research results and existing problems of ALD technology used in various types of solar cells are introduced in detail,and the development trends are prospected.
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