A high-density conduction-based micro-DNA identification array fabricated with a CMOS compatible process

Jiong Li,Mei Xue,Zuhong Lu,Zhikuan Zhang,Chuguang Feng,Mansun Chan
DOI: https://doi.org/10.1109/TED.2003.816545
IF: 3.1
2003-01-01
IEEE Transactions on Electron Devices
Abstract:A high-density CMOS-compatible deoxyribonucleic acid (DNA) array fabricated with a modified metallization process is demonstrated. The array consists of silicon nitride isolation to confine the DNA sample to a specific cell area defined by silicon dioxide to achieve low crosstalk between neighboring cells. A prehybridization process together with a conductive enhancement method are also developed ...
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