The point spread function assessment of MeV electron imaging quality for thick specimens

Fang Wang,Hai-Bo Zhang,Meng Cao,Ryuji Nishi,Kiyokazu Yoshida,Akio Takaoka
DOI: https://doi.org/10.1007/978-3-540-85156-1_172
2008-01-01
Abstract:Electron tomography (ET) with the high voltage electron microscope (HVEM) or the ultra-HVEM is becoming particularly useful for relatively thick amorphous specimens. This may extend utilization of ET to both biology and physical science [1]. However, tilting a thick specimen in ET results in the increase of its effective thickness, and thus may degrade the image quality due to multiple scattering. In this presentation, we investigate the dependence of the image quality on the accelerating voltage and the effective thickness of the tilted thick specimen in the ultra-HVEM at Osaka University.
What problem does this paper attempt to address?