Mesoporous Silica Thin Films Prepared by Argon Plasma Treatment of Sol–gel-Derived Precursor

J Zhang,A Palaniappan,XD Su,FEH Tay
DOI: https://doi.org/10.1016/j.apsusc.2004.10.049
IF: 6.7
2004-01-01
Applied Surface Science
Abstract:Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FTIR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.
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