Neural Network Based Intelligent R2R Predictive Control to CMP Process

Wang Liang,Hu Jingtao
DOI: https://doi.org/10.3969/j.issn.1003-353x.2012.04.014
2012-01-01
Abstract:For chemical mechanical polishing(CMP)process characteristics of nonlinear,time-varying and not being in-situ easily measured,CMP process neural network run-to-run(R2R) predictive controller named NNPR2R was proposed.Radial basis function(RBF) neural network predictive model about CMP was constructed by subtractive clustering algorithms and least squares method,thus the difficult problem of constructing accurate mathematical model of complicated CMP process was solved and the prediction accuracy was improved.Control law was calculated by particle swarm optimization(PSO) rolling optimization,therefore the problem that the derivative-based optimization technology was easy to fall into local optimum was solved and the control precision was improved.Simulation results illustrate that the performance of NNPR2R controller is better than that of EWMA,process drifts and shifts are suppressed significantly,variation in various runs of products is reduced,and the root mean squared error for material removal rate(MRR) is brought down substantially.
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