Gas Phase Controlled Deposition of High Quality Large-Area Graphene Films

Shishir Kumar,Niall McEvoy,Tarek Lutz,Gareth P. Keeley,Valeria Nicolosi,Chris P. Murray,Werner J. Blau,Georg S. Duesberg
DOI: https://doi.org/10.1039/b919725g
IF: 4.9
2010-01-01
Chemical Communications
Abstract:A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 degrees C.
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