Selective‐area Growth of Periodic Iron‐garnet Thin Films

Xiwen Zhang,Shiyou Xu,Gaorong Han
DOI: https://doi.org/10.1002/pssa.200925307
2010-01-01
Abstract:A new approach for the fabricantion of periodic crystalline iron, garnet thin films is introduced. Crystalline iron game planar triangular-disposed thin film arrays are fabricated on SCGG substrate based on a selective-are growth process consisting of electron-beam lithography patterning. Soft ion-miling selective-epitaxy, and chemical etching. Aluminum thin film is utilized in the processing, acting as a conductive layer to overcome any change build-up problem for the dielectric substrate. X-ray diffraction results confirm that a crystalline iron-garnet film can be deposited on a soft ion-bombarded (GdCa)(3) (GaMgZ)(5)O(12), (SGGG) surface by radio frequency (RT) plasma double ion beam puttering. planar periodic triangular disposed films rare observed rom field emission scanning electron microspe and atom force microscope, with diameters of 200-300 nm at height of 30 nm, and a spacing interval of 350 nm A typical hysteresis loop of magnetic material is obtained. All results show this styructure has great potentiat to be used as two dimensional magnetic photonic crystal (2D-MPCs) and the selectively growth can also be used to fabricate other 2D MPCs. (C) WILEY-VCH GmbH & Co. KGaA, Weinheim
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