Characterization of electroelastic beams under biasing fields with applications in buckling analysis

Y. T. Hu,J. S. Yang,Q. Jiang
DOI: https://doi.org/10.1007/s00419-001-0197-2
2002-01-01
Archive of Applied Mechanics
Abstract:Summary A theoretical model for coupled extension and flexure with shear deformations of an electroelastic beam under biasing fields is presented. Derived from the full three-dimensional theory of electroelasticity for small-intensity fields superposed upon finite biasing fields, the equations governing the electrical and mechanical fields defined along the beam axis permit a simplified analysis of the electromechanical behavior of beam-like structures. As examples to illustrate the applications of this model, the authors analyse buckling of three electroelastic beams, one single-layered and two double-layered ones. The analysis indicates that the electromechanical coupling strengthens the beams against buckling.
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