Abstract:A laser‐based solution to produce highly‐controllable arrays of deep nanoholes at the surface of dielectric materials is reported. Dedicated shaping of a short‐pulse laser beam is exploited to process dense square arrays of holes with diameters down to 200 nm and depths in the range 3–20 μm. This opens perspectives for manufacturing integrated devices using this cost‐effective alternative nanofabrication method. Periodic nanohole arrangements constitute an important building block of advanced photonic devices. Aside from standard nanofabrication tools, a direct laser‐based approach is introduced here, that enables single‐step and point‐by‐point machining of arrays of holes with subwavelength diameters and depths reaching several micrometers at the surface of fused silica. The method relies on a simple optical arrangement including an axicon combined with an amplitude mask to shape the laser intensity in appropriately truncated micro‐Bessel beams of adjustable length. The suitability and limitations of the technique are investigated to fabricate arrays of cylindrical nanoholes with tunable depths. In particular, the challenge of avoiding crosstalk effects during the laser‐writing process of high‐density arrays is explored. The achievability of square arrays of nanoholes at the surface of fused silica, with diameters down to 200 nm and variable depths from 3 to 20 μm at a spatial density defined by a pitch of 1.5 μm is demonstrated. The performance level shows the potential of the direct‐laser‐processing method towards the realization of integrated devices, offering a highly flexible and cost‐effective alternative technique to current nanofabrication methods.

Large-Area Micro/Nanostructures Fabrication in Quartz by Laser Interference Lithography and Dry Etching

Microfabrication Assisted by Laser-Trapped Microparticle Tools

Fabrication of Gold Micro/nanostructures by Femtosecond Laser Direct Writing and Chemical Etching

Liquid-Assisted Femtosecond Laser Precision-Machining of Silica.

Nano fabrication by laser interference

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Nanostructure engineering of epitaxial piezoelectric α-quartz thin films on silicon

Gold-film Coating Assisted Femtosecond Laser Fabrication of Large-Area, Uniform Surface Micro/nanostructures

Fabrication of Large-Scale Uniform Submicron Inverted Pyramid Pit Arrays on Silicon Substrates by Laser Interference Lithography

Research on a Micro-Processing Technology for Fabricating Complex Structures in Single-Crystal Quartz

Superhydrophobic Dual Micro- And Nanostructures Fabricated By Direct Laser Interference Lithography

Investigation on Femtosecond Laser-Assisted Microfabrication in Silica Glasses

Fast, High Efficiency and Cost-Effective Laser Nano-Lithography

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of Ultraviolet-Nanoimprint Mold of 2-Dimensional Sub-Wavelength Structured Surface on Quartz Substrate

Silicon Three-Dimensional Structures Fabricated by Femtosecond Laser Modification with Dry Etching

Potential of CO2-laser processing of quartz for fast prototyping of microfluidic reactors and templates for 3D cell assembly over large scale

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses

Gold-film coating assisted femtosecond laser fabrication of large-area, uniform periodic surface structures.