Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films
J. W. Zhang,G. He,J. Gao,X. S. Chen,X. F. Chen,B. Deng,Y. M. Liu,M. Zhang,J. G. Lv,Z. Q. Sun
DOI: https://doi.org/10.1166/sam.2014.2124
2014-01-01
Science of Advanced Materials
Abstract:High-permittivity hafnium titanate (HfxTi1-xO2) films have been deposited on Si substrates by RF sputtering and subjected to rapid thermal annealing at various temperatures in air. Post annealing temperature dependent microstructure and optical properties of the HfxTi1-xO2 films were investigated by X-ray diffraction (XRD), spectroscopic ellipsometry (SE), atomic force microscope (AFM), and ultraviolet-visible spectroscope (UV-Vis). Analysis from XRD reveals that the as-deposited films are amorphous as well as those samples annealed at lower annealing temperature. However, with increasing annealing temperature, polycrystalline structure with highly (-111) preferential orientation appears. AFM results show that annealing leads to the increase in surface roughness. Combined with UV-Vis and SE measurements, red shift in band gap has been observed as a function of annealing temperature. Additionally, increase in optical constant has been confirmed by SE based on Cauchy-Urbach model.