Influences of HBP-SiO2 on Curing Kinetics of Cyanate Ester Resins

ZHANG Meng-meng,YAN Hong-xia,GUAN Xing-hua,WANG Qian-qian
DOI: https://doi.org/10.3969/j.issn.1001-5922.2012.03.021
2012-01-01
Abstract:In order to improve the dispersity of nano-SiO2 in the resins matrix,the nano-SiO2 grafted with hyperbranched polysiloxane(HBP-SiO2) was used to modify the cyanate ester(CE) resins.A kinetic analysis of the HBP-SiO2/CE system as the electrical packaging materials was carried out via differential scanning calorimetry(DSC).The curing process parameters and curing kinetics parameters were obtained as follows:gelling temperature 150.17 ℃,cuing temperature 197.81 ℃,post-treating temperature 258.97 ℃;activation energy 11.22kJ/mo1,reaction order 0.75,frequency factor 18 342.84s-1,respectively.The results indicated that the addition of HBP-SiO2 can lower the activation energy of the PPO/CE system and the curing reaction can occur at a relative low temperature.
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