Effect of hydrofluoric acid etching time on the topography and surface roughness of lithium disilicate glass ceramic

REN Dong-feng,LUO Xiao-ping
DOI: https://doi.org/10.3877/cma.j.issn.1674-1366.2013.01.005
2013-01-01
Abstract:Objective To analyze the effect of hydrofluoric acid (HFA) etching time on the surface roughness and the topography of lithium disilicate glass ceramic. Methods Fifteen glass ceramic disks (10 mm in diameter and 1 mm in thickness) were made from IPS e.max Press ingots by lost-wax, hot-pressed ceramic fabrication technology, and then divided randomly into five groups (three per group) after polishing. The ceramic surfaces of different groups were etched by 9.5% hydrofluoric acid gel for 0, 20, 40, 60, and 120 s, respectively. Atomic force microscope (AFM) was used to evaluate the surface roughness and the 3D topography. Microstructure was also analyzed by the field emission scanning electron microscope (FE-SEM). Results The result showed that the etching with hydrofluoric acid resulted in preferential dissolution of glass matrix, and that partially supported crystals within the glass matrix were lost with the increase of etching time. AFM measurements indicated that the Ra [(17.2 ± 1.6)、(241.8 ± 23.6)、(290.6 ± 38.2)、(322.6 ± 19.6) and (371.3 ± 43.0) nm] of ceramic increased with the HFA etching time, and there was a positive correlation between the surface roughness (Ra and Rq) and the etching time. Conclusions HF etching can significantly improve the surface roughness of lithium disilicate glass ceramic. The study demonstrates the benefits of combining two microscopic methods for a better understanding of the etched ceramic surface.
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