Formation in Situ of Electrodeposited Fulleride Film on a Microelectrode

FX Cheng,NQ Li,WJ He,ZN Gu,XH Zhou,YL Sun,YQ Wu
DOI: https://doi.org/10.1016/0022-0728(96)04516-0
IF: 4.598
1996-01-01
Journal of Electroanalytical Chemistry
Abstract:In this paper, the formation in situ of an electrodeposited film of (TBA+)n(Cn−60) (n = 1 to 3) on a microelectrode and its voltammetric behavior have been studied. The method consists of electroreducing C60 in a mixed solvent of acetonitrile and xylene (1:6 v/v) and a supporting electrolyte of 0.08 M TBAPF6 at a potential sufficiently negative to generate C3−60 anion, followed by deposition of (TBA+)3(C3−60) on a microdisk electrode. Deposition conditions of the film and some of its characteristics were investigated. The standard surface electron-transfer rate constants k0 and electron-transfer coefficient α of the two stripping reactions were determined.
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