Effects of TriSilanolIsobutyl-POSS on Thermal Stability of Methylsilicone Resin

Y. R. Liu,Y. D. Huang,L. Liu

DOI: https://doi.org/10.1016/j.polymdegradstab.2006.04.031

IF: 5.204

2006-01-01

Polymer Degradation and Stability

Abstract:Methylsilicone resin/polyhedral oligomeric silsesquioxane (POSS) composites with various proportions of POSS monomer were synthesized by the reaction of functionalized TriSilanolIsobutyl-POSS macromonomer with hydroxyl-terminated methylsilicone resin. The structures of the obtained hybrid polymers were characterized with Fourier-transformed infrared (FT-IR) and transmission electron microscopy (TEM). The FT-IR spectra suggested successful bonding of TriSilanolIsobutyl-POSS and methylsilicone resin. TEM analysis showed that POSS can dissolve in methylsilicone resin at the molecular level. The influences of TriSilanolIsobutyl-POSS on the thermal stability and degradation behavior of methylsilicone resin were studied by thermogravimetric analysis (TGA), solid-state 29Si NMR and X-ray photoelectron spectroscopy (XPS). All these techniques showed that TriSilanolIsobutyl-POSS incorporation results in increased decomposition temperatures and oxidation resistance, primarily by reducing the effect of silanol end groups on the thermolysis through condensation reaction of Si–OH groups and partial loss of isobutyl followed by the formation of an inorganic SiO2 layer to prevent methylsilicone from further degradation.