A 2.2-V 2.9-Ppm/℃bicmos Bandgap Voltage Reference with Full Temperature-Range Curvature-Compensation

Zhou Zekun,Ma Yingqian,Ming Xin,Zhang Bo,Li Zhaoji
DOI: https://doi.org/10.1088/1674-4926/31/7/075004
2010-01-01
Abstract:A high precision high-order curvature-compensated bandgap reference compatible with the standard BiCMOS process, which uses a simple structure to realize a novel exponential curvature compensation in lower temperature ranges, and a piecewise curvature correction in higher temperature ranges, is presented. Experiment results of the proposed bandgap reference implemented with a 0.6-μm BCD process demonstrate that a temperature coefficient of 2.9 ppm/°C is realized at a 3.6-V power supply, a power supply rejection ratio of 85 dB is achieved, and the line regulation is better than 0.318 mV/V for 2.2–5 V supply voltage dissipating a maximum supply current of 45 μA. The active area of the presented bandgap reference is 260 × 240 μm2.
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