Formation of Si Nanocrystals in Glass by Femtosecond Laser Micromachining
Geng Lin,Huaihai Pan,Ye Dai,Fei He,Danping Chen,Ya Cheng,Xiongwei Jiang,Long Zhang,Jianrong Qiu,Quanzhong Zhao
DOI: https://doi.org/10.1016/j.matlet.2011.07.106
IF: 3
2011-01-01
Materials Letters
Abstract:We report on the precipitation of Si nanocrystals inside a borosilicate glass by using an 800nm, 250kHz femtosecond laser irradiation, which was confirmed with X-ray diffraction, Raman spectra and transmission electron microscopy analyses. Refractive index profile reveals that the refractive index of the Si nanocrystals precipitated region increased up to 8.7% in comparison with that of the unirradiated area, leading to a large diffraction efficiency of the fabricated dot structure. Furthermore, the third-order optical nonlinearity of the Si nanocrystals precipitated glass is greatly enhanced based on the Z-scan measurement. These results may find applications for the fabrication diffractive optical devices and optical switches.