Role of TiO 2 coating layer on the performance of Cu 2 O photocathode in photoelectrochemical CO 2 reduction
Muhammad Bilal Akbar,Yue Gong,Yanjie Wang,Abebe Reda Woldu,Xuehua Zhang,Tao He
DOI: https://doi.org/10.1088/1361-6528/ac0ddb
IF: 3.5
2021-07-09
Nanotechnology
Abstract:TiO<sub>2</sub> is usually employed as a protective layer for Cu<sub>2</sub>O in photoelectrocatalytic CO<sub>2</sub> reduction. However, the role of TiO<sub>2</sub> layer on CO<sub>2</sub> reduction activity and selectivity is still elusive. In this work, a systematic investigation is carried out to probe the impact of the deposition parameters of TiO<sub>2</sub> overlayer, including the temperature and thickness, on CO<sub>2</sub> reduction performance. Compositional and (photo-)electrochemical analysis is performed to explore the property of TiO<sub>2</sub> overlayers. Carrier behavior, including donor density and electron energy, and stability of TiO<sub>2</sub> are demonstrated to be influenced by atomic layer deposition conditions and thus play a role in controlling CO<sub>2</sub> reduction reaction. Specifically, as the thickness of the TiO<sub>2</sub> layer increases from 2 to 50 nm, the electron energy tends to be lowered accompanying the electron transfer mode from tunneling for TiO<sub>2</sub> thin layers to type II for thick TiO<sub>2</sub>, leading to a decrease in CO<sub>2</sub> reduction selectivity. With an increase of the TiO<sub>2</sub> deposition temperature, the stability increases with a loss of conductivity. Cu<sub>2</sub>O coated with 2 nm TiO<sub>2</sub> at 150 °C is proven to be the optimized candidate in this work for photoelectrochemical reduction of CO<sub>2</sub> to CO, HCOOH and CH<sub>3</sub>COOH under an applied bias of −0.4 versus RHE.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology