Abstract:Diamond-like carbon (DLC) films have been grown on a small scale by many researchers. While there are many potential applications of DLC films, a method of growing them on an industrial scale has been lacking. We have developed a low-temperature dc plasma process that is larger than typical lab scale, and can easily be scaled up further. With our unique electrode configuration, a stable dc discharge could be maintained, and highly reproducible films are obtained. Films are also grown on substrates of various geometries. Good films with average thickness of 2 μm were grown on semiconductors, metals, insulators, and plastics. An ionic mechanism dominated the deposition process. Solid state 13C cross polarization magnetic angle spinning nuclear magnetic resonance was used to determine carbon sp2/sp3 ratios which were typically 1.6. Combustion and 15N nuclear reaction tests showed 33 at. % H. X-ray diffraction and transmission electron microscopy were used to check for regions of crystallinity. Infrared spectroscopy was used to confirm C–H bonding. Hardness was measured with a light load microhardness tester (10 g); average hardness was close to SiC. Friction and wear were characterized using standard pin-on-disk measurements; no wear was observed on the film-coated disk, and the coefficient of friction was 0.03–0.07 for film-against-film. The films were resistant to concentrated strong acids and stable to 460 °C in air. Some applications for low friction coatings have been explored.

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