Progress on Formation and Prevention of Defects in Thin Film Coating

Zhao-miao LIU,Yan-mei JIN,Hua-min LIU

DOI: https://doi.org/10.3969/j.issn.1009-6094.2008.03.033

2008-01-01

Abstract:This paper is aimed at classifying and summarizing the likely causes leading to the defects of thin film and the likely influential factors resulting in its defects in aviation,mechanical,electronic and optical devices to form striations,chatters as well as bubbles. As is widely known,thin film is widely applied in modern engineering,for example,in aviation,mechanical and electronic engineering and IT industry with its primary functions being wear-resisting,corrosion-prevention,reducing reflections and water-proofing. However,its defects may lead to serious economic and materialistic losses and damage. It is for the purpose to raise the quality of the film by studying the ways to better prevention from such coating defects that we have made detailed investigation and summarization on the commonly happening defects with the thin coating film material and classified the defects concerned into two categories,i.e. the continuous and discrete defects,according to the their distribution locations. The defects can also be classified into those caused by surface tension of the coating solution,evaporation of superficial solution,and the stability of coating system,which can be thought of some chief influential factors quoted here but a few. The proposed method here on how to prevent the defect formation may also contribute to the improvement of the design schemes on coating solution and coating die as a result of the investigation we have done.