Abstract:As a pillar material of semiconductors, single-crystal silicon (Si) has attracted much attention due to its excellent electronic properties. Meanwhile, femtosecond laser processing as a convenient fabrication method for miniaturized structures provides an effective way to improve the performance of Si-based devices. However, the final-state analysis of femtosecond laser-induced Si micro-nano structures remains to be explored. In this study, the evolution of the micro-nano structures and the variation of surface and subsurface damage with pulse number were studied. Based on the atomic structure, the amorphous layer, dislocation layer, and unaffected layer were found. The amorphous layer resulted from the re-solidification of melted materials. The dislocation layer consisted of dislocations and lattice distortion. The unaffected layer retained the initial lattice structure and was not affected by laser irradiation. The high temperature and stress induced by multiple pulses led to the stacking faults and nano-twins in the subsurface layer. The evolution of the Si structure was essentially a transition process from a dislocation layer to a high-density defect layer and a transition process from nanotips to laser-induced periodic surface structures. During this process, dislocations dominated the femtosecond laser-induced microstructural deformation, affecting the nano-hardness of the irradiated surface. As a result, the nano-hardness of Si structures fabricated using femtosecond laser processing was maximally enhanced by 9.54%. This work provides new information about ultrafast laser-induced surface and subsurface damage, which is significant for the efficient and high-precision fabrication of Si-based functional micro-nano devices.

Pulse-parameter Dependence of the Configuration Characteristics of a Micro-Structure in Fused SiO 2 Induced by Femtosecond Laser Pulses

Evolution of Microstructures on Silicon Induced by Femtosecond Laser with Multiple Pulses

Effect of Laser Parameters in the Micromachining of Silicon by Femtosecond Pulse Laser

One-Step femtosecond laser irradiation of Single-Crystal Silicon: Evolution of Micro-Nano structures and damage investigation

Effects of Parameters in Femtosecond Laser Micromachining on Ablation of Silicon

Combined Continuum-Atomistic Modeling of Ultrashort-Pulsed Laser Irradiation of Silicon

Silicon micro-structuring using ultra-short laser pulses

Temporal-spatial Dynamics of Femtosecond Time Resolved Plasma in Femtosecond Laser Induced Microstructure

Study of Nanosecond Pulse Laser Micro-Fabrication

Microstructure Evolution And Ft-Ir Spectra Of Silicon Induced By Pulsed Laser Irradiation

Generation and erasure of femtosecond laser-induced periodic surface structures on nanoparticle-covered silicon by a single laser pulse.

Ultrafast Dynamics of Femtosecond Laser Irradiation of Silicon with Different Fluence

Parametric Study of Femtosecond Pulses Laser Hole Drilling of Silicon Wafer

Temporal Femtosecond Pulse Shaping Dependence of Laser-Induced Periodic Surface Structures in Fused Silica

Investigation of structural transformation and residual stress under single femtosecond laser pulse irradiation of 4H–SiC

Structure-Mediated Excitation of Air Plasma and Silicon Plasma Expansion in Femtosecond Laser Pulses Ablation

Formation of diversiform microstructures in wide-bandgap materials by tight-focusing femtosecond laser pulses

Picosecond Pulse Laser Microstructuring of Silicon

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

The influence of ultrafast temporal energy regulation on the morphology of Si surfaces through femtosecond double pulse laser irradiation

Microstructures Induced by Femtosecond Laser Pulses Inside Glasses