Nano-photolithography Using Super-Resolution Near-Field Structure

WANG Pei,ZHANG Dou-guo,TANG Lin,LU Yong-hua,JIAO Xiao-jin,MING Hai
DOI: https://doi.org/10.3969/j.issn.1007-5461.2005.06.002
2005-01-01
Abstract:Super-resolution near-field structure (Super-RENS) is a newly developed technology based on traditional super-resolution optical disk and near-field optics. The principle of super-RENS and its applications in nano-photolithography are reviewed. The broad muti-mask-layer structure that can realize super-resolution beyond diffraction limit is called Super-RENS. The investigation on surface plasmons in nano-optics is very import.
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