Monte Carlo Simulation of the Spontaneous Oscillation in Electrochemical Deposition

M. J. Ha,F. Fang,J.-M. Liu,M. Wang
DOI: https://doi.org/10.1140/epjd/e2005-00143-4
2005-01-01
Abstract:. We report a new Monte Carlo model to simulate the spontaneous oscillating growth in Cu(II)-acid electrochemical deposition system, and present the one-to-one correspondence between the oscillation of pH and the layered structure. Two mechanisms essential for the oscillation behavior, i.e. the adsorption and buffering, are incorporated into the deposition sequences. The simulation results are qualitatively in agreement with the experimental observations. Some system parameters essential for the oscillation generation are discussed. And through adjusting the adsorption ratio, the spatially columnar deposited structure is generated and the columnar alternative growth of copper and cuprous oxide phases is achieved.
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