Characterization of Ferroelectric Naxk1-Xnbo3 System Films Prepared by Pulsed Laser Deposition

Fengping Lai,Rong Tu,Takashi Goto,Jingfeng Li
DOI: https://doi.org/10.2320/matertrans.mra2008116
2008-01-01
MATERIALS TRANSACTIONS
Abstract:Ferroelectric NaxK1-xNbO3 (NKN) films were prepared on quartz and Pt/SrTiO3(100) substrates by pulsed laser deposition. The effects of composition and preparation conditions on the crystal structure and ferroelectricity of the NKN films were investigated by changing the Na content (x), substrate temperature (T-sub), Oxygen partial pressure (PO2) target-to-substrate distance (Dt-s,) and laser energy density (E-L). The permittivity values of the NKN films were 390 to 520 at room temperature and 100kHz, showing a maximum at x = 0.5. The maximum remnant polarization value was 8.2 x 10(-2) Cm-2 at x = 0.5. [doi: 10.2320/matertrans.MRA2008116]
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