Nanoscopic Morphologies in Block Copolymer Nanorods As Templates for Atomic‐Layer Deposition of Semiconductors

Yong Wang,Yong Qin,Andreas Berger,Eric Yau,Changcheng He,Lianbing Zhang,Ulrich Goesele,Mato Knez,Martin Steinhart
DOI: https://doi.org/10.1002/adma.200900136
IF: 29.4
2009-01-01
Advanced Materials
Abstract:Block-copolymer nanorods containing mesopore structures derived from confinement-induced nanoscopic morphologies were used as templates for atomic-layer deposition. Diffusion of the ALD precursors through the polymeric scaffold and deposition of ZnO on the walls of the internal mesopores yielded 1D ZnO nanostructures with hierarchical architectures containing helices and stacked doughnuts as structure motifs.
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