Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Colloidal Lithography——Construction and Application of Nanostructured Surfaces

Colloidal lithography--the art of nanochemical patterning

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Colloidal Nanosurfactants for 3D Conformal Printing of 2D Van Der Waals Materials.

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Architecture Design And Applications Of Nanopatterned Arrays Based On Colloidal Lithography

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

Unconventional Lithography for Patterned Nanomaterials

Nanosphere Lithography from Template-Directed Colloidal Sphere Assemblies

Preparation of High-Quality Colloidal Mask for Nanosphere Lithography by a Combination of Air/Water Interface Self-Assembly and Solvent Vapor Annealing

High-resolution combinatorial patterning of functional nanoparticles

Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Creation of Nanostructures by Interference Lithography for Modulation of Cell Behavior

Three-dimensional Colloidal Crystal-Assisted Lithography for Two-Dimensional Patterned Arrays.

Colloidal monolayer at the air/water interface: Large-area self-assembly and in-situ annealing

A Novel Approach for Colloidal Lithography: From Dry Particle Assembly to High-Throughput Nanofabrication

Hybrid Top-Down/Bottom-Up Strategy Using Superwettability for the Fabrication of Patterned Colloidal Assembly

Ultrafast Fabrication of Large‐Area Colloidal Crystal Micropatterns Via Self‐Assembly and Transfer Printing

Advances in direct optical lithography of nanomaterials

Stimuli-Responsive Surface Ligands for Direct Lithography of Functional Inorganic Nanomaterials

Writing on Nanocrystals: Patterning Colloidal Inorganic Nanocrystal Films through Irradiation-Induced Chemical Transformations of Surface Ligands