Study on Synthesis of Material for Rapid Prototyping and Photopolymerisable Reaction

JIA Haitao,WANG Yongzhen,WANG Ailing
DOI: https://doi.org/10.3321/j.issn:1005-023X.2006.12.036
2006-01-01
Abstract:In this paper a photosensitive resin--the key material for the ultraviolet curing based on acrylic acid esterified epoxy resin E-51 is synthesized. The mechanism of esterification and photopolymerization are discussed, curing structure and photopolymerisable degree of the architecture are characterized by SEM and IR, respectively. The results show that the esterification of epoxy resin is that epoxy matrix breaks and C=C is introduced. The mechanism of photopolymerisable reaction is that C=C degrades and C-C extends. The pattern of film is irregular crosslinked form construction.Fixing other conditions, the UV-curing degree is optimal when photo-initiator content is 3.5%.
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