Abstract:With the continuous development of the field of information technology, there has been a demand for recording mark size of optical data storage, optical imaging resolving power, and characteristic linewidth of photolithography to reach nanoscale. However, it is very difficult to realize the goal due to the optical diffraction limit restrictions. Much interest has focused on the study of optical far-field super-resolution spot by using pupil filters. However, common concerns have continued to plague super-resolving pupil filters based on either scalar diffraction theory or vector diffraction theory. These concerns include the fact that the side lobe becomes non-negligible when the central lobe is squeezed to a certain extent. Moreover, it is difficult to reduce the super-resolving spot to nanoscale. In this work, we proposed a novel method to combine the super-resolving pupil filters with nonlinear saturable absorption thin films to reduce the central spot size to nanoscale, lower the intensity ratio of side lobe to central lobe, and elongate the depth of focus or tunable tolerance distance between the super-resolving spot and sample. The simulated results indicate that by using the three-zone annular binary phase filter as the super-resolving pupil filter and Sb2Te3 as the nonlinear saturable absorption thin films, the central spot size can be reduced to nanoscale, the side lobe intensity is squeezed to about 10% of the central lobe intensity, and the tunable tolerance distance between the super-resolving spot and the sample is about two times that of the depth of focus of the diffraction limited spot at the incident laser wavelength of 405nm and the numerical aperture of focusing lens of 0.95. The combination of the super-resolving pupil filters with the nonlinear saturable absorption thin films is very useful for nano-optical data storage, maskless nanolithography, and nano-optical imaging. It is also easy to use in actual applications because of the operation in the far-field range.

Design theories and performance limits of diffractive superresolution elements with the highest sidelobe suppressed.

Design of diffractive superresolution elements for optical data storage

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Enhanced superprism effect based on positive/negative lateral shift of reflective beam in a Fabry-Perot filter.

Spatial-frequency-shift Enables Integrated Super-Resolution Microscopy: Advance and Perspective

Design and Experimental Test of Diffractive Superresolution Elements

Theories for the Design of a Hybrid Refractive-Diffractive Superresolution Lens with High Numerical Aperture.

Fast Method for Designing Broadband Achromatic Diffractive Optical Elements.

Application and Research of Harmonic Diffractive/Refractive Optics in Visible Spectrum

High-performance Imaging with an Advanced Non-Imaging Lens Based on Full-Path Optical Diffraction Calculation in Two-Dimensional Space

A METHOD TO ANALYZE EFFECTS OF DIFFRACTION EFFICIENCY OF DIFFRACTION OPTICAL ELEMENT ON THE PERFORMANCE OF HYBRID OPTICAL SYSTEM

Diffractive superresolution elements for radially polarized light.

Diffractive Super-Resolution Element Design with Effective Sidelobe Intensity Controlling

Designing Diffractive Optical Elements for Special Functions Using a Rigorous Method

Diffractive Phase Screen for Superresolution Focal Spot

Design, Fabrication and Analysis of a Hybrid-Order Monolithic Imaging Diffractive Lens on a Germanium Substrate

Performance improvement of super-resolving pupil filters via combination with nonlinear saturable absorption films

Sidelobe suppression design of etched diffraction grating demultiplexers using optimized air trenches in front of each output waveguide.

Design of Diffractive Optical Elements for Controllable Axial Long Depth of Focus

Superresolution Technology for Small Diffraction Spot Size in the Far Field

Rigorous Concept For The Analysis Of Diffractive Lenses With Different Axial Resolution And High Lateral Resolution