Abstract:Epitaxial crystallization of isotactic polystyrene (iPS) on the oriented isotactic polypropylene (iPP) substrate and the reverse process, that is, epitaxial growth of iPP crystals on the oriented iPS film initially generated by epitaxy of it on iPP, have been investigated through transmission electron and atomic force microscopies. Epitaxy of iPS on the ordered iPP substrate was achieved by cold crystallization of an amorphous thin film at 130 °C for 2 h. The results indicate that epitaxy of iPS on the iPP substrate has parallel chain relationship. Epitaxial growth of iPP on the oriented iPS film was realized by selective melting of the iPP in the epitaxial iPP/iPS system at 190 °C for 5 min and then crystallizing at varied temperatures. It was found that oriented recrystallization of iPP on the itself-induced iPS epitaxially oriented substrate occurs at temperatures below 30 °C and produces exactly the same parallel mutual chain alignment, indicating the reversibility of epitaxy between iPP and iPS. It does, however, not happen at temperatures over 60 °C, reflecting a temperature-dependent epitaxial growth of iPP on iPS oriented films. This was explained by secondary nucleation and indicates that a larger dimension of substrate crystals than the depositing epitaxial ones is necessary for the occurrence of polymer epitaxy. This provides a theoretical basis for the substrate selection of polymer epitaxies.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acs.macromol.1c01429.ED patterns of iPS/iPP double layers taken after different radiation times under the electron beam and AFM images and a representative ED pattern of iPP melt grown on the itself-induced iPS oriented substrate at 100 and 130 °C (PDF)This article has not yet been cited by other publications.

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