Pendant Thiol Groups-Attached Pd(II) for Initiating Metal Deposition

LN Xu,JH Liao,L Huang,N Gu,HQ Zhang,JZ Liu
DOI: https://doi.org/10.1016/s0169-4332(03)00226-5
IF: 6.7
2003-01-01
Applied Surface Science
Abstract:A new activation method has been developed for initiating electroless metal deposition on silicon substrates without SnCl2 sensitization and roughening condition. Silicon wafers are first coated with thiol-terminated self-assembled monolayers (SAMs), and then catalyzed with a stable tin-free Pd(II)-based colloidal solution. Atomic force microscopy (AFM), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) were used to characterize the step-by-step surfaces and study the binding mechanism of Pd(II) with SAMs onto surfaces. Results show that Pd(II) oligomer particles are chemisorbed on pendant thiol surfaces through SPd bonds. This process involves fewer steps than the conventional Sn/Pd combined activation one. Furthermore, the chemical bound initiator possesses longevity and can be stored for a long time before metallization.
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