Abstract:Accurate pattern transfer, coupled with stringent requirements for throughput and quality in lithography systems, necessitates the wafer scanner to execute an aggressive motion with the tracking error in terms of nanometers. This underscores the need for advanced control technologies. The aim of this article is to identify motion control issues in wafer scanners taking the accuracy requirement and the mechatronic dynamics into account and then investigate the control methods for plants with diverse dynamics. Motion control aspects that will be discussed include: 1) setpoint generator that creates smooth motion profiles through trajectory planning and input shaping; 2) multi-degree of freedom (DOF) decoupling control with static and dynamic design; 3) single-DOF motion control utilizing the combination of linear/nonlinear feedback and model-/data-based feedforward; and 4) multistage coordination control for the synchronized motion between wafer stage (WS) and reticle stage (RS), short-stroke module (SSM), and long-stroke module (LSM), as well as LSM and balance mass (BM). The control challenges associated with these aspects mainly involve: 1) crosstalk behaviors among motion DOFs; 2) flexible modes in the mechatronic dynamics; 3) model uncertainties; 4) stochastic and nonstochastic disturbances/noise; and 5) inherent design tradeoffs such as Bode's sensitivity integral. Both long-known and next-generation motion control methods are investigated and discussed with appropriate insightful comments.

The Design of Control System in Lithography Wafer Stage

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Design for Control System of Reticle Stage for Lithography Machine Based on Macro-Micro Control Strategy

Preliminary Exploration on Control Theory of Ultraprecision Stage with Large Travel

Design of Coarse-fine Control System for Wafer Stage of Lithography Based on PQ Method

Sliding Mode Control of Macro-micro System for Wafer Stage of Lithography

Design of Coarse-Fine Combined Synchronization Control System for Lithography Based on Cross-Coupled Sliding Mode Control

Motion Control of Wafer Scanners in Lithography Systems: from Setpoint Generation to Multi-Stage Coordination

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Modeling and Sliding-Mode Control of Wafer Stage in Lithrography Machines

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Design of Movement Control System of Laser Micro-Processing

Embedded Design on Optical Coherence Tomography Control System

Design and Cooperation Control Analysis of a Coarse-Fine Dual Stage Drive Positioning System

Ultra-precision Motion Control and Synchronization Control for Stage of Lithography

Control Software Design of Stepping Motors for Micro-Operation of Fiber Measuring

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The design of a control system for use with a 3-3R spherical type parallel glue-spray device

Research on the Control of Reticle Stage Macro Movement Motor