Research on Linear Active Disturbance Rejection Control over Linear Motor

LIU Chuan,ZHU Fei-jia,MA Wei,CHEN Xing-lin

DOI: https://doi.org/10.3969/j.issn.1007-449x.2013.01.012

2013-01-01

Abstract:The wafer stage of lithography is high dynamic precision servo motion platform.An nm-level positioning precision is required by using macro movement of long stroke linear motor and high-precision micro movement of voice coil motor,while the platform is moving in high-speed.In order to reduce the movement scope and acceleration of voice coil motor,the tracking precision of linear motor must be improved.A linear active disturbance rejection controller design for linear motor was presented.The controller was designed through an extended state observer to estimate the system's state and the external disturbance.To improve the tracking performance of the dynamic system,the tracking error was added to the reference input and used as feed-forward error compensation.Under such a combined control method,the controller has the ability of active disturbance rejection,the feed-forward error compensation controller compensates tracking error well,and the disturbance rejection and tracking control performances are thus enhanced.The experiments show the control system synthesis procedures and a substantial improvement over the tracking error generated by the traditional control method alone.