On the Resolution of the Low-Energy Electron Reflection Microscope

Z SHAO,AV CREWE

DOI: https://doi.org/10.1016/0304-3991(89)90214-3

IF: 2.994

1989-01-01

Ultramicroscopy

Abstract:A wave-electron-optical treatment of the low-energy electron reflection microscope is used to calculate the resolution in the presence of spherical and chromatic aberrations. An estimate based on a simple system shows that the limiting resolution coul be as small as 3 nm.

What problem does this paper attempt to address?

Resolution Criteria in Double-Slit Microscopic Imaging Experiments

Shangting You,Cuifang Kuang,Baile Zhang

DOI: https://doi.org/10.1038/srep33764

IF: 4.6

2016-01-01

Scientific Reports

Abstract:Double-slit imaging is widely used for verifying the resolution of high-resolution and super-resolution microscopies. However, due to the fabrication limits, the slit width is generally non-negligible, which can affect the claimed resolution. In this paper we theoretically calculate the electromagnetic field distribution inside and near the metallic double slit using waveguide mode expansion method and acquire the far-field image by vectorial Fourier optics. We find that the slit width has minimal influence when the illuminating light is polarized parallel to the slits. In this case, the claimed resolution should be based on the center-to-center distance of the double-slit.
Chromatic Aberration and Low-Voltage SEM

Zhifeng Shao,A.V. Crewe

DOI: https://doi.org/10.1017/s0424820100127293

1987-01-01

Abstract:For scanning electron microscopes, it is plausible that by lowering the primary electron energy, one can decrease the volume of interaction and improve resolution. As shown by Crewe /1/, at V0 =5kV a 10Å resolution (including non-local effects) is possible. To achieve this, we would need a probe size about 5Å. However, at low voltages, the chromatic aberration becomes the major concern even for field emission sources. In this case, δV/V = 0.1 V/5kV = 2x10-5. As a rough estimate, it has been shown that /2/ the chromatic aberration δC should be less than ⅓ of δ0 the probe size determined by diffraction and spherical aberration in order to neglect its effect. But this did not take into account the distribution of electron energy. We will show that by using a wave optical treatment, the tolerance on the chromatic aberration is much larger than we expected.
High-Resolution Imaging with an Aberration-Corrected Transmission Electron Micrscope

M. Lentzen,B. Jahnen,C.L. Jia,K. Urban

DOI: https://doi.org/10.1017/s1431927600030592

IF: 4.0991

2001-01-01

Microscopy and Microanalysis

Abstract:In electron microscopy high-resolution imaging of finest object structures is generally hampered by the influence of aberrations of the lens system, especially the high spherical aberration of the objective lens. The delocalization of contrast details induced by aberrations is especially strong for microscopes equipped with a field emission gun providing a high spatial coherence. in recent years a prototype of an aberration correction system has been constructed by Haider et al., following a suggestion by Rose, consisting of two hexapole elements and four additional round lenses. The correction system was adapted to a Philips CM 200 FEG ST microscope with an information limit of 0.13 nm. The alignment is carried out using aberration measurements deduced from Zemlin tableaus. By appropriately exciting the hexapole elements it is possible to reduce or even fully compensate the spherical aberration of the objective lens. With the freedom of a variable spherical aberration C s new operation modes can be accessed that are not available in standard microscopes. with C s = 0 and defocus Z = 0 pure amplitude contrast occurs, together with a vanishing contrast delocalization; phase contrast with a single, narrow pass-band up to the information limit can still be achieved by Z = ±7 nm, which introduces a delocalization of R = 0.13 nm. with Cs = 97 μm and Z = −18 nm the broad Scherzer pass-band for phase contrast can be extended to the information limit, with R = 0.35 nm. For the CM 200 C s = 43 fim and Z = −12 nm still produces a high level of phase contrast, comparable with the extended Scherzer pass-band, but with R = 0.08 nm only. in the latter mode Scherzer’s defocus equals Lichte's defocus of least confusion.
A compact low energy electron microscope for surface analysis

Guanhua Zhang,Julong Sun,Yanling Jin,Kan Zang,Fangzhun Guo,Xueming Yang

DOI: https://doi.org/10.1063/1674-0068/26/04/369-373

IF: 1.09

2013-01-01

Chinese Journal of Chemical Physics

Abstract:The description and function characterization of a flange-on type low energy electron microscope are given. In this microscope a magnetic beam separator with 10 degrees deflection angle is used in order to facilitate compacting the instrument on a single 10 in. flange. Meanwhile some correcting elements in the electron optical system are simplified to reduce the complexities of construction and operation. The sample is set close to ground potential, so that all the electrostatic lenses are easily to float at high voltages. The performance of the microscope in typical low energy electron microscopy, low energy electron diffraction and photoemission electron microscopy modes is demonstrated through several experiments. A lateral resolution of 51 nm is estimated for low energy electron microscopy imaging. With femtosecond laser as light source, the consequent nonlinear photoemission makes this microscope also suitable for the observation of optical near field phenomena and a lateral resolution of 110 nm is obtained.
A new aberration-corrected, energy-filtered LEEM/PEEM instrument. I. Principles and design

R M Tromp,J B Hannon,A W Ellis,W Wan,A Berghaus,O Schaff

DOI: https://doi.org/10.1016/j.ultramic.2010.03.005

IF: 2.994

Ultramicroscopy

Abstract:We describe a new design for an aberration-corrected low energy electron microscope (LEEM) and photo electron emission microscope (PEEM), equipped with an in-line electron energy filter. The chromatic and spherical aberrations of the objective lens are corrected with an electrostatic electron mirror that provides independent control over the chromatic and spherical aberration coefficients C(c) and C(3), as well as the mirror focal length, to match and correct the aberrations of the objective lens. For LEEM (PEEM) the theoretical resolution is calculated to be approximately 1.5 nm (approximately 4 nm). Unlike previous designs, this instrument makes use of two magnetic prism arrays to guide the electron beam from the sample to the electron mirror, removing chromatic dispersion in front of the mirror by symmetry. The aberration correction optics was retrofitted to an uncorrected instrument with a base resolution of 4.1 nm in LEEM. Initial results in LEEM show an improvement in resolution to approximately 2 nm.
Principle and prospect to improve the resolution of field emission scanning electron microscope

Qianqian Liao

Abstract:In present paper, the principle to improve the resolution of FE-SEM ha s been discussed. The analysis results indicate that the resolution of the instr ument mainly depends on C s ( C s—the spherical aberration coefficient o f the objective lens).If the equifinal spherical aberration coefficient can be d ecreased to the level of 0.1×10 -2 cm, the resolution of the secondary elec tron image would be about 0.322 nm at V A=30kV. Furthermore, the limit res olution of FE-SEM evaluated by present paper can be achieved to the level of 0. 178 nm at V A=30kV under the conditions of C s=0 and α =5×10 -2 rad. (α—the semi-angle of the scanning electron beam).

Engineering,Chemistry,Materials Science,Physics
Atomic Structure Imaging Using an Aberration-Corrected Transmission Electron Microscope

Markus Lentzen,Chun Lin Jia,Knut Urban

DOI: https://doi.org/10.1017/s1431927603012108

IF: 4.0991

2003-01-01

Microscopy and Microanalysis

Abstract:In his article from 1949, The Theoretical Resolution Limit of the Electron Microscope, Otto Scherzer investigated the conditions under which single atoms should be directly visible in the electron microscope [1]. He took into account not only the resolution limit but also the contrast in the image, and he concluded: the imaging of weakly scattering atoms, such as carbon, using an optimal focus, which we call nowadays Scherzer’s defocus, should be possible with a resolution limit of 0.2 nm.
Toward High-Resolution Low-Voltage SEM

Zhifeng Shao

DOI: https://doi.org/10.1017/s0424820100103152

1988-01-01

Abstract:Recently, low voltage (≤5kV) scanning electron microscopes have become popular because of their unprecedented advantages, such as minimized charging effects and smaller specimen damage, etc. Perhaps the most important advantage of LVSEM is that they may be able to provide ultrahigh resolution since the interaction volume decreases when electron energy is reduced. It is obvious that no matter how low the operating voltage is, the resolution is always poorer than the probe radius. To achieve 10Å resolution at 5kV (including non-local effects), we would require a probe radius of 5∽6 Å. At low voltages, we can no longer ignore the effects of chromatic aberration because of the increased ratio δV/V. The 3rd order spherical aberration is another major limiting factor. The optimized aperture should be calculated as
Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function.

Vitor R. Manfrinato,Jianguo Wen,Lihua Zhang,Yujia Yang,Richard G. Hobbs,Bowen Baker,Dong Su,Dmitri Zakharov,Nestor J. Zaluzec,Dean J. Miller,Eric A. Stach,Karl K. Berggren

DOI: https://doi.org/10.1021/nl5013773

IF: 10.8

2014-01-01

Nano Letters

Abstract:One challenge existing since the invention of electron-beam lithography (EBL) is understanding the exposure mechanisms that limit the resolution of EBL. To overcome this challenge, we need to understand the spatial distribution of energy density deposited in the resist, that is, the point-spread function (PSF). During EBL exposure, the processes of electron scattering, phonon, photon, plasmon, and electron emission in the resist are combined, which complicates the analysis of the EBL PSF. Here, we show the measurement of delocalized energy transfer in EBL exposure by using chromatic aberration-corrected energy-filtered transmission electron microscopy (EFTEM) at the sub-10 nm scale. We have defined the role of spot size, electron scattering, secondary electrons, and volume plasmons in the lithographic PSF by performing EFTEM, momentum-resolved electron energy loss spectroscopy (EELS), sub-10 nm EBL, and Monte Carlo simulations. We expect that these results will enable alternative ways to improve the resolution limit of EBL. Furthermore, our approach to study the resolution limits of EBL may be applied to other lithographic techniques where electrons also play a key role in resist exposure, such as ion-beam-, X-ray-, and extreme-ultraviolet lithography.
Resolution Deterioration in Emission Electron Microscopy Due to Object Roughness

SA Nepijko,NN Sedov,G Schonhense,M Escher,XH Bao,WX Huang

DOI: https://doi.org/10.1002/andp.20005120602

2000-01-01

Annalen der Physik

Abstract:In the present paper a general analytic expression has been obtained and confirmed by a computer simulation which links the surface roughness of an object under study in an emission electron microscope and it's resolution. A quantitative derivation was made for the model case when there is a step on the object surface. It was shown that the resolution is deteriorated asymmetrically relative to the step. The effect sets a practical limit to the ultimate lateral resolution obtainable in an emission electron microscope.
Chromatic Confocal Electron Microscopy with A Finite Pinhole Size

P. Wang,A. I. Kirkland,P. D. Nellist

DOI: https://doi.org/10.1088/1742-6596/371/1/012002

2012-01-01

Journal of Physics Conference Series

Abstract:Scanning confocal electron microscopy (SCEM) is a new imaging mode in electron microscopy. Spherical aberration corrected electron microscope instruments fitted with two aberration correctors can be used in this mode which provides improved depth resolution and selectivity compared to optical sectioning in a conventional scanning transmission geometry. In this article, we consider the depth resolution and energy resolution in the confocal optical configuration for SCEM using inelastically scattered electrons with a finite pinhole size. We experimentally demonstrate energy-filtered optical sectioning in a double aberration-corrected instrument with uncorrected chromatic aberration without using a dedicated energy filter.
Direct Estimation and Correction of Residual Aberrations in the Reconstructed Exit-Wavefunction of a Crystalline Specimen

Z. K. Chen,W. Q. Ming,Y. T. He,R. H. Shen,G. S. Chen,M. J. Yin,J. H. Chen

DOI: https://doi.org/10.1016/j.micron.2022.103247

IF: 2.381

2022-01-01

Micron

Abstract:Measuring residual aberrations up to second order using a crystalline specimen in transmission electron microscope is challenging. Here, we show by good examples of both experimental and simulated images that it is feasible to measure aberrations up to the second-order, using minimum amplitude contrast criterion for the exit wave function reconstructed. We propose a two-steps strategy for the task: (i) Firstly measuring defocus and two-fold astigmatism simultaneously to avoid error accumulation and to reduce the number of dimensions in parameters space. (ii) Then, with minimized misleading effects (or errors) in defocus and two-fold astigmatism, estimations of three-fold astigmatism and coma can be conducted more efficiently and effectively. Influences of other factors such as specimen structure, resolution and specimen thickness on the validity of the method are also discussed in detail. Our study provides a practical procedure for correcting residual aberrations in image wave using crystalline materials, which can then facilitate application of exit wave reconstruction technique to materials research.
Theoretical Calculation of Probe Size of Low‐voltage Scanning Electron Microscopes

J XIMEN,Z SHAO,PSD LIN

DOI: https://doi.org/10.1111/j.1365-2818.1993.tb03330.x

IF: 1.9522

1993-01-01

Journal of Microscopy

Abstract:SummaryDetailed investigating into the effects of spherical and chromatic aberrations, diffraction and the probe current allows the more general formulae for the optimized aperture and the minimum probe radius in low‐voltage scanning electron microscopes (LVSEMs) to be derived using both wave optics and geometric optics. The probe sizes for a diversity of electron sources in LVSEMs have been estimated, which may be useful for practical applications. The computed results indicate the possibility of achieving 1·5–2·0‐nm resolution at low voltages.
Spherical aberration correction in a scanning transmission electron microscope using a sculpted foil

Roy Shiloh,Roei Remez,Peng-Han Lu,Lei Jin,Yossi Lereah,Amir H. Tavabi,Rafal E. Dunin-Borkowski,Ady Arie

DOI: https://doi.org/10.1016/j.ultramic.2018.03.016

2017-05-16

Abstract:Nearly twenty years ago, following a sixty year struggle, scientists succeeded in correcting the bane of electron lenses, spherical aberration, using electromagnetic aberration correction. However, such correctors necessitate re-engineering of the electron column, additional space, a power supply, water cooling, and other requirements. Here, we show how modern nanofabrication techniques can be used to surpass the resolution of an uncorrected scanning transmission electron microscope more simply by sculpting a foil of material into a refractive corrector that negates spherical aberration. This corrector can be fabricated at low cost using a simple process and installed on existing electron microscopes without changing their hardware, thereby providing an immediate upgrade to spatial resolution. Using our corrector, we reveal features of Si and Cu samples that cannot be resolved in the uncorrected microscope.

Instrumentation and Detectors,Optics
Electron ptychography of 2D materials to deep sub-ångström resolution

Yi Jiang,Zhen Chen,Yimo Han,Pratiti Deb,Hui Gao,Saien Xie,Prafull Purohit,Mark W. Tate,Jiwoong Park,Sol M. Gruner,Veit Elser,David A. Muller

DOI: https://doi.org/10.1038/s41586-018-0298-5

IF: 64.8

2018-07-01

Nature

Abstract:Aberration-corrected optics have made electron microscopy at atomic resolution a widespread and often essential tool for characterizing nanoscale structures. Image resolution has traditionally been improved by increasing the numerical aperture of the lens (α) and the beam energy, with the state-of-the-art at 300 kiloelectronvolts just entering the deep sub-ångström (that is, less than 0.5 ångström) regime. Two-dimensional (2D) materials are imaged at lower beam energies to avoid displacement damage from large momenta transfers, limiting spatial resolution to about 1 ångström. Here, by combining an electron microscope pixel-array detector with the dynamic range necessary to record the complete distribution of transmitted electrons and full-field ptychography to recover phase information from the full phase space, we increase the spatial resolution well beyond the traditional numerical-aperture-limited resolution. At a beam energy of 80 kiloelectronvolts, our ptychographic reconstruction improves the image contrast of single-atom defects in MoS2 substantially, reaching an information limit close to 5α, which corresponds to an Abbe diffraction-limited resolution of 0.39 ångström, at the electron dose and imaging conditions for which conventional imaging methods reach only 0.98 ångström.

multidisciplinary sciences
The Limits of Resolution and Dose for Aberration-Corrected Electron Tomography

Reed Yalisove,Suk Hyun Sung,Peter Ercius,Robert Hovden

DOI: https://doi.org/10.1103/PhysRevApplied.15.014003

2020-06-12

Abstract:Aberration-corrected electron microscopy can resolve the smallest atomic bond-lengths in nature. However, the high-convergence angles that enable spectacular resolution in 2D have unknown 3D resolution limits for all but the smallest objects ($< \sim$8nm). We show aberration-corrected electron tomography offers new limits for 3D imaging by measuring several focal planes at each specimen tilt. We present a theoretical foundation for aberration-corrected electron tomography by establishing analytic descriptions for resolution, sampling, object size, and dose---with direct analogy to the Crowther-Klug criterion. Remarkably, aberration-corrected scanning transmission electron tomography can measure complete 3D specimen structure of unbounded object sizes up to a specified cutoff resolution. This breaks the established Crowther limit when tilt increments are twice the convergence angle or smaller. Unprecedented 3D resolution is achievable across large objects. Atomic 3D imaging (1$\unicode{xC5}$) is allowed across extended objects larger than depth-of-focus (e.g. $>$ 20nm) using available microscopes and modest specimen tilting ($<$ 3$^\circ$). Furthermore, aberration-corrected tomography follows the rule of dose-fractionation where a specified total dose can be divided among tilts and defoci.

Materials Science,Optics
Resolution and aberration correction in liquid cell transmission electron microscopy

Niels de Jonge,Lothar Houben,Rafal E. Dunin-Borkowski,Frances M. Ross

DOI: https://doi.org/10.1038/s41578-018-0071-2

IF: 83.5

2018-12-19

Nature Reviews Materials

Abstract:Liquid cell electron microscopy possesses a combination of spatial and temporal resolution that provides a unique view of static structures and dynamic processes in liquids. Optimizing the resolution in liquids requires consideration of both the microscope performance and the properties of the sample. In this Review, we survey the competing factors that determine spatial and temporal resolution for transmission electron microscopy and scanning transmission electron microscopy of liquids. We discuss the effects of sample thickness, stability and dose sensitivity on spatial and temporal resolution. We show that for some liquid samples, spatial resolution can be improved by spherical and chromatic aberration correction. However, other benefits offered by aberration correction may be even more useful for liquid samples. We consider the greater image interpretability offered by spherical aberration correction and the improved dose efficiency for thicker samples offered by chromatic aberration correction. Finally, we discuss the importance of detector and sample parameters for higher resolution in future experiments.

materials science, multidisciplinary,nanoscience & nanotechnology
Three-dimensional imaging by optical sectioning in the aberration-corrected scanning transmission electron microscope

G. Behan,E. C. Cosgriff,Angus I. Kirkland,Peter D. Nellist

DOI: https://doi.org/10.1098/rsta.2009.0074

2009-09-28

Abstract:The depth resolution for optical sectioning in the scanning transmission electron microscope is measured using the results of optical sectioning experiments of laterally extended objects. We show that the depth resolution depends on the numerical aperture of the objective lens as expected. We also find, however, that the depth resolution depends on the lateral extent of the object that is being imaged owing to a missing cone of information in the transfer function. We find that deconvolution methods generally have limited usefulness in this case, but that three-dimensional information can still be obtained with the aid of prior information for specific samples such as those consisting of supported nanoparticles. We go on to review how a confocal geometry may improve the depth resolution for extended objects. Finally, we present a review of recent work exploring the effect of dynamical diffraction in zone-axis-aligned crystals on the optical sectioning process.
Optimization of Monochromated TEM for Ultimate Resolution Imaging and Ultrahigh Resolution Electron Energy Loss Spectroscopy.

Sergei Lopatin,Bin Cheng,Wei-Ting Liu,Meng-Lin Tsai,Jr-Hau He,Andrey Chuvilin

DOI: https://doi.org/10.1016/j.ultramic.2017.08.016

IF: 2.994

2017-01-01

Ultramicroscopy

Abstract:The performance of a monochromated transmission electron microscope with Wien type monochromator is optimized to achieve an extremely narrow energy spread of electron beam and an ultrahigh energy resolution with spectroscopy. The energy spread in the beam is improved by almost an order of magnitude as compared to specified values. The optimization involves both the monochromator and the electron energy loss detection system. We demonstrate boosted capability of optimized systems with respect to ultra-low loss EELS and sub-angstrom resolution imaging (in a combination with spherical aberration correction).
Resolution And Degrees Of Freedom In Near Field Scanning Microscopy

guiying wang,zhihua ding,zhifeng fan,zhijiang wang

DOI: https://doi.org/10.1117/12.218684

1995-01-01

Abstract:An expression of evanescent field of the scanning near-field optical microscope (SNOM) and a few effects on the resolving power are given. The concept about degrees of freedom of light information transmitted and resolution of SNOM are reviewed.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

On the Resolution of the Low-Energy Electron Reflection Microscope

Resolution Criteria in Double-Slit Microscopic Imaging Experiments

Chromatic Aberration and Low-Voltage SEM

High-Resolution Imaging with an Aberration-Corrected Transmission Electron Micrscope

A compact low energy electron microscope for surface analysis

A new aberration-corrected, energy-filtered LEEM/PEEM instrument. I. Principles and design

Principle and prospect to improve the resolution of field emission scanning electron microscope

Atomic Structure Imaging Using an Aberration-Corrected Transmission Electron Microscope

Toward High-Resolution Low-Voltage SEM

Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function.

Resolution Deterioration in Emission Electron Microscopy Due to Object Roughness

Chromatic Confocal Electron Microscopy with A Finite Pinhole Size

Direct Estimation and Correction of Residual Aberrations in the Reconstructed Exit-Wavefunction of a Crystalline Specimen

Theoretical Calculation of Probe Size of Low‐voltage Scanning Electron Microscopes

Spherical aberration correction in a scanning transmission electron microscope using a sculpted foil

Electron ptychography of 2D materials to deep sub-ångström resolution

The Limits of Resolution and Dose for Aberration-Corrected Electron Tomography

Resolution and aberration correction in liquid cell transmission electron microscopy

Three-dimensional imaging by optical sectioning in the aberration-corrected scanning transmission electron microscope

Optimization of Monochromated TEM for Ultimate Resolution Imaging and Ultrahigh Resolution Electron Energy Loss Spectroscopy.

Resolution And Degrees Of Freedom In Near Field Scanning Microscopy