Pulsed laser deposition of conducting porous La-Sr-Co-O films

X. Chen,N.J. Wu,D.L. Ritums,A. Ignatiev
DOI: https://doi.org/10.1016/S0040-6090(98)01347-9
IF: 2.1
1999-01-01
Thin Solid Films
Abstract:La0.5Sr0.5CoO3-delta (LSCO) films for use in solid oxide fuel cells (SOFC) have been deposited on yttria stabilized zirconia (YSZ)(100) substrates by pulsed laser deposition (PLD). Both epitaxial and porous-polycrystalline films were fabricated. The porous films were formed by deposition at room temperature followed by anneal at from 450-750 degrees C to increase porosity. Resistivity measurements have shown that the porous LSCO films annealed at 550 degrees C yielded the lowest resistivity of 10(-2) Omega cm. The epitaxial LSCO films were deposited on YSZ(100) in the temperature range of 450 to 750 degrees C, and showed (110) preferred orientation. The electrical resistivity of the epitaxial LSCO films is 10(-3) Omega.cm for films deposited at 550 degrees C. (C) 1999 Elsevier Science S.A. All rights reserved.
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