Design Of Ku-Band Sir Interdigital Bandpass Filter Using Silicon-Based Micromachining Technology

Hao Sheng,Huajun Chen,Tong Yu,Yelei Feng
DOI: https://doi.org/10.1109/IRI.2010.5558957
2010-01-01
Abstract:This paper presents design, fabrication, and measurement of a Ku-band micromachined bandpass filter. The fourth-order interdigital filterd based on step-impedance resonators (SIRs) is fabricated and self-packaged by three high-resistivity( > 10K Omega cm) silicon wafers to achieve compactness and low loss. The proposed circuit is designed to produce a passband of 21% centered at 14.2 GHz. Experimental results exhibit that the insertion loss is 2.3dB and the return loss is better than 20 dB within passband. The fabrication technology can be applied for other micromachined devices.
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