Abstract:Black silicon is a promising and effective candidate in the field of photoelectric devices due to the high absorptance and broad-spectrum absorption property. The deposition around the processing area induced by the pressure of SF 6 , gravity, and the block of the processing chamber interferes the adjacent laser ablation and hampers uniform large-scale black silicon fabrication. To solve the problem, femtosecond laser- induced black silicon assisted with laser plasma shockwave cleaning is creatively proposed in our study. The results showed that higher, denser, and more uniform microstructures can be obtained than the conventional laser-induced method without laser cleaning. The average absorptance is 99.15% in the wavelength range of 0.3–2.5 μm, while it is more than 90% in the range of 2.5–20 μm. In addition, the scanning pitch dependence of surface morphology is discussed, and the better result is obtained in the range of 25–35 μm with 40-μm laser spot. Finally, a large-scale 50-mm × 50-mm black silicon with uniform microstructures was prepared by our method. It has been demonstrated that the deposition is effectively eliminated via our method, and the optical absorption is also enhanced significantly. It is of great significance for realizing large-scale preparation of photoelectric devices based on black silicon and lays the foundation for the development of laser-inducing equipment and industrial application.

Preparation of Black Silicon by Means of Wet Etching

Fabrication of Black Silicon Materials by Wet Etching and Characterization

Optical properties of black silicon prepared by wet etching

Black Silicon with Self-Cleaning Surface Prepared by Wetting Processes

One-step fabrication of nanoporous black silicon surfaces for solar cells using modified etching solution

Black Silicon with Order-Disordered Structures for Enhanced Light Trapping and Photothermic Conversion

Formation Mechanism and Characterization of Black Silicon Surface by a Single-Step Wet-Chemical Process

Enhanced Absorption in the Wide Wavelength Range: Black Silicon Decorated with Few-Layer PtS2

Large-Scale Black Silicon Induced by Femtosecond Laser Assisted With Laser Cleaning

Recent Progress of Black Silicon: From Fabrications to Applications

Study on the Optical Characteristic of "black Silicon" Antireflection Coating Prepared by Plasma Immersion Ion Implantation

Size-controllable fabrication of nano-to-microstructures on silicon surface using high-density ion etching with pulsed bias

Anti-Reflectance Optimization of Secondary Nanostructured Black Silicon Grown on Micro-Structured Arrays.

Ultralow Broadband Reflectivity in Black Silicon Via Synergy Between Hierarchical Texture and Specific‐Size Au Nanoparticles

A novel method to fabricate the black silicon for the solar cell

Comparison of Different Etching Methods on the Morphology and Semiconductor Characters of Black Silicon

Advances in Fabrication and Application of Black Silicon

Large-Scale Wideband Light-Trapping Black Silicon Textured by Laser Inducing Assisted with Laser Cleaning in Ambient Air

Optimization of the Surface Structure on Black Silicon for Surface Passivation

Near-Infrared Absorptance Enhancement and Device Application of Nanostructured Black Silicon Fabricated by Metal-Assist Chemical Etching

Surface analysis and process optimization of black silicon.