Fabrication method of double-slit-grating for high resolution microspectrometers

Zhiyou Zhang,Yukun Zhang,Shuhong Li,Jinglei Du,Fuhua Gao,Ruiying Shi,Bangcheng Yang
DOI: https://doi.org/10.1016/j.mee.2012.07.064
IF: 2.3
2012-01-01
Microelectronic Engineering
Abstract:Graphical abstractDisplay Omitted Highlights¿ A double-slit-grating (DSG) is presented for improving the spectral resolution of microspectrometer. ¿ Develop a simple and low-cost method of fabricating DSG. ¿ The spectral properties of DSG is calculated which can realize the spectral resolution of 0.1nm. In this paper, a double-slit-grating (DSG) is presented for improving the spectral resolution of microspectrometer. We try to develop a simple and low-cost fabrication method by synthetically using the interference lithography, ion etching technique and localized surface plasmon imaging lithography: A grating was first obtained with traditional interference lithography, and then it was copied by using transparent material polydimethylsiloxane (PDMS) to form a soft mask, which can contact the silver superlens firmly, and finally the DSG will be fabricated though localized surface plasmon imaging lithography. This double-slit-grating can enhance the spectral resolution of microspectrometers to 0.1nm level. DSG made of metal has rich spectral characteristics and spectral sensibility, which makes it suitable for biomedical sensors.
What problem does this paper attempt to address?