Enhanced adsorption purification of fluoromethane electronic gas using carbon adsorbent with rich ultramicroporosity

Xuan Wei,Shengjun Du,Jiawu Huang,Junjie Peng,Jiamin Liao,Zhuhong Fu,Yanshan Chen,Zewei Liu,Guang Miao,Neng Liao,Jing Xiao

DOI: https://doi.org/10.1016/j.ces.2024.120250

IF: 4.7

2024-05-24

Chemical Engineering Science

Abstract:Ultra-pure fluoride electronic gas is an indispensable cleaning and etching gas in the semiconductor industry. Adsorptive separation based on porous materials can be a promising technology to effectively separate ultra-pure CH 3 F (>99.9999 %) from trace C 3 H 8 impurity (∼100 ppm). Herein, a series of glucose-derived carbon adsorbents (GCAs) were prepared using a combination strategy of pre-oxidation and KOH activation. Among obtained adsorbents, C-HCP-1 showed a high micropore surface area of 1472 m 2 g −1 and ultramicropore (<8 Å) volume of 0.332 cm 3 g −1 . The rich ultramicroporosity enabled C-HCP-1 to exhibit a remarkable C 3 H 8 uptake of 0.164 mmol g −1 at 0.01 kPa and 298 K, and C 3 H 8 /CH 3 F IAST selectivity of 40.0. A highly linear correlation (R 2 > 0.98) has been observed between C 3 H 8 /CH 3 F selectivity and ultramicropore volume. Breakthrough experiments verified that 7 N-grade CH 3 F could be produced from C 3 H 8 /CH 3 F mixtures (1/9999, v/v) with a record productivity of 3715 L kg −1 . Meanwhile, excellent cycle stability and moisture stability suggest C-HCP-1 as a competitive candidate for highly-efficient purification of industrial electronic gas.

engineering, chemical