Effects of annealing on thermal stress generation during the cooling process of large-size silica glass

Suping Yin,Chengshuai Li,Haisheng Fang,Qianli Ma
DOI: https://doi.org/10.2139/ssrn.4645972
IF: 4.458
2024-01-31
Journal of Non-Crystalline Solids
Abstract:High-temperature two-step chemical vapor deposition (CVD) is a promising method of preparing large-scale silica glass, in which thermal stress is generated due to uneven temperature distribution when cooling naturally to room temperature. In this paper, a numerical model of the annealing and cooling processes has been established to study the generation and evolution of thermal stress. Furthermore, the annealing parameters, including annealing temperature and annealing time, are investigated to control thermal stress. The simulation results proved that variations in annealing temperature and annealing time can significantly affect the thermal stress generated during the annealing and cooling process. The residual stress decreases with increasing annealing temperature and annealing time. To optimize the annealing process, two-step annealing, including higher and lower temperature stages, has been studied. It is found that stepwise annealing can reduce the residual stress and the stress peaks with a shorter annealing time in the high-temperature stage.
materials science, multidisciplinary, ceramics
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