Abstract:The influence of external potentials on the electrochemical corrosion characteristics and pitting resistance of Low Carbon High Chromium (H), Duplex (D), Corrosion Resistant (R) duplex stainless steel after film formation was investigated by techniques such as dynamic potential scanning, constant potential polarization, Electrochemical Impedance Spectroscopy (EIS), conjunction with Scanning Electron Microscope (SEM) and Energy Dispersive Spectroscopy (EDS) analysis, were used to examine the effects of passivation potential and over-passivation potential on the pitting resistance of HDR duplex stainless steel, compared with naturally film-formed HDR corrosion resistance. Results show that in a 3.5% NaCl solution, the passivation range of HDR duplex stainless steel is 0~1.0 V, with certain current fluctuation appearing in the unstable pitting region around 1.0 V. As the film formation potential increases, the impedance first increases then decreases, and the carrier concentration first decreases then increases. At 0.9 V, the impedance is at its maximum, the carrier concentration is at its minimum, and the corrosion resistance is the best; at 1.2 V, the impedance is at its minimum, the carrier concentration is at its maximum, and the corrosion resistance is the worst; the natural film formation sample falls between 0.1 V and 0.7 V. After pitting tests, pitting mainly occurs at the ferrite structure and its boundaries for the naturally film-formed and film-formed potentials below 1.0 V samples, but pitting mainly occurs at the austenite structure and its boundaries in the 1.2 V film-formed sample, indicating a reversal of corrosion in the structural pitting. The sample with the film formation potential of 0.1 V developed many small pits on the surface after pitting test, which is related to the oxidation of Mo.

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