Optimum temperature of atomic layer deposition of alumina on CsPbBr 3 quantum-dot for optical performance and environmental stability

Zijun Yan,Fangshun Ye,Liyue Xu,Xiao Yang,Shouqiang Lai,Shuli Wang,Yue Lin,Guolong Chen,Yijun Lu,Hao-Chung Kuo,Zhong Chen,Tingzhu Wu
DOI: https://doi.org/10.1016/j.jlumin.2023.119905
IF: 3.6
2023-05-10
Journal of Luminescence
Abstract:Atomic layer deposition (ALD) plays a pivotal role in raising the long-term stability of perovskite quantum dot (PQD). The deposition temperature of excellent alumina film prepared by ALD is generally higher than 200 °C. In such a temperature environment, the lattice morphology of PQD is seriously damaged. In this work, to effectively protect PQD, the optimum temperature for depositing alumina on the surface of CsPbBr 3 PQD is investigated. The CsPbBr 3 PQD is deposited on a transparent glass substrate. Subsequently, an alumina layer is deposited on the surface of PQD via ALD at a deposition temperature of 40–120 °C. In our experiment, the significant degradation of PQD is observed when the deposition temperature of ALD is set to 80 °C and above. Lowering the deposition temperature can effectively improve the optical performance of PQD. The samples with alumina deposited at 75 °C show excellent stability after undergoing aging tests, and therefore 75 °C is considered the best ALD temperature. Besides, white light-emitting diode (W-LED) is produced by a method that a stack structure consisting of CsPbBr 3 coated via ALD at 75 °C and CdSe QD is excited using blue Micro-LED, and the color gamut of W-LED accounts for the wide area of 94.00% NTSC (1953) and 86.20% Rec.2020 displayed wide color gamut features. The experiment provides practical guidance for selecting the optimal deposition temperature for ALD-packaged PQD-based devices.
optics
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