Atomic-Scale Friction and Adhesion at Ambient Pressure

Joong Il Jake Choi,Hunyoung Cho,Jeong Young Park
DOI: https://doi.org/10.1021/acs.langmuir.4c01146
IF: 3.9
2024-10-15
Langmuir
Abstract:In this Perspective, we present the recent advancement and the prospects of atomic-scale friction and adhesion measurements across the pressure gap between ultrahigh vacuum and ambient pressure environments using variable-pressure atomic force microscopy (VP-AFM). We introduce the VP-AFM that enables nanotribological studies under various gas conditions with partial pressure ranging from UHV (1.0 × 10-10 mbar) to 1 bar. We highlight the frictional behaviors of ultrananocrystalline diamond surface in oxygen and water gas environments, as well as the chemical states probed with near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS). The atomic scale degradation processes of MA(CH3NH3)PbBr3, which is an organic-inorganic hybrid perovskite (OHP) investigated with VP-AFM are introduced. Finally, we discuss the potential works on catalytic model systems including bimetallic Pt3Ni(111) and TiO2(110) and the future perspective of nanotribology under ambient conditions.
What problem does this paper attempt to address?